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The improvement of laser induced damage resistance of optical workpiece surface by hydrodynamic effect polishing

机译:水动力效应抛光改善激光对光学工件表面的抗损伤性能

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Surface and subsurface damage in optical element will greatly decrease the laser induced damage threshold (LIDT) in the intense laser optical system. Processing damage on the workpiece surface can be inevitably caused when the material is removed in brittle or plastic mode. As a non-contact polishing technology, hydrodynamic effect polishing (HEP) shows very good performance on generating an ultra-smooth surface without damage. The material is removed by chemisorption between nanoparticle and workpiece surface in the elastic mode in HEP. The subsurface damage and surface scratches can be effectively removed after the polishing process. Meanwhile ultra-smooth surface with atomic level surface roughness can be achieved. To investigate the improvement of LIDT of optical workpiece, polishing experiment was conducted on a magnetorheological finishing (MRF) silica glass sample. AFM measurement results show that all the MRF directional plastic marks have been removed clearly and the root-mean-square (rms) surface roughness has decreased from 0.673nm to 0.177nm after HEP process. Laser induced damage experiment was conducted with laser pulse of 1064nm wavelength and 10ns time width. Compared with the original state, the LEDT of the silica glass sample polished by HEP has increased from 29.78J/cm~2 to 45.47J/cm~2. It demonstrates that LIDT of optical element treated by HEP can be greatly improved for ultra low surface roughness and nearly defect-free surface/subsurface.
机译:光学元件中的表面和亚表面损伤将大大降低强激光光学系统中的激光诱导损伤阈值(LIDT)。当以脆性或塑性方式去除材料时,不可避免地会对工件表面造成加工损伤。作为一种非接触式抛光技术,水动力效应抛光(HEP)在产生超光滑表面而无损坏方面显示出非常好的性能。通过在HEP中以弹性模式在纳米粒子和工件表面之间进行化学吸附来去除材料。在抛光过程之后,可以有效地去除表面下的损坏和表面划痕。同时可以实现具有原子级表面粗糙度的超光滑表面。为了研究光学工件LIDT的改进,在磁流变精加工(MRF)石英玻璃样品上进行了抛光实验。 AFM测量结果表明,经过HEP处理后,所有MRF定向塑性标记均已被清楚地去除,并且均方根(rms)表面粗糙度已从0.673nm降低至0.177nm。以1064nm波长和10ns时间宽度的激光脉冲进行了激光诱导的损伤实验。与原始状态相比,HEP抛光的石英玻璃样品的LEDT从29.78J / cm〜2增加到45.47J / cm〜2。结果表明,通过HEP处理的光学元件的LIDT可以大大提高,以实现超低的表面粗糙度和几乎无缺陷的表面/亚表面。

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