NEAR-FIELD MICROSCOPY AT MILLIMETER WAVES

摘要

Existing methods and facilities for quality testing of electronic industry products do not allow to realize the full-scale testing of such objects as integrated circuits and multilayer thin-film nanostructures etc. under conditions of their poor optical transparence. Near field-microscopy in microwave and millimeter wave bands allows overcoming this limitation owing to the opportunity to use the frequencies, at which investigated materials are radiotransparent. The precision of visualization and resolution of this technique completely meets the demands, suggested for the mentioned objects [1]. The description of methods and devices of near-field microscopy and the radiophysical equipment developed within the limits of scientific and technical cooperation of the Ukrainian and Lithuanian scientific personnel [2-4] is given in the paper.