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Surface charge dynamics and OH and H number density distributions in near-surface nanosecond pulse discharges at a liquid / vapor interface

机译:液/蒸气界面近表面纳秒脉冲放电中的表面电荷动力学以及OH和H数密度分布

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The present experiments provide new insight into surface charge dynamics in repetitive nanosecond pulse, surface ionization wave discharges sustained over quartz and distilled water surfaces. At low pulse repetition rates (~100 Hz), residual surface charge density on quartz surface and distilled water surface does not exceed ~10% and ~25-30%, respectively, of the peak value during the discharge pulse, with the exception of data taken near the maximum extent of the surface ionization wave from the high voltage electrode, where wave amplitude becomes fairly low. This corresponds to ~1% and ~ 5-10% fraction of energy stored on the surface, compared to energy coupled to the plasma. In the discharge over distilled water surface, surface charge deposition is more pronounced, residual surface charge density is higher, and its decay is considerably slower. However, net discharge energy fraction stored on the surface remains quite low, and surface charge is almost completely neutralized several μs after the pulse. At high pulse repetition rates (~ 10 kHz), ionization wave discharge sustained by an alternating polarity pulse train results in neutralization of surface charge deposited by a previous pulse by the next, opposite polarity pulse. This effect is observed in discharges over both quartz surface and distilled water surface. In the discharge over quartz surface, sustained by the same polarity pulse trains, no significant residual surface charge accumulation over multiple pulses is detected. In the discharge over distilled water surface, sustained by same polarity pulse trains, significant residual surface charge accumulation over multiple pulses is detected for negative polarity pulses, while the effect for positive polarity pulses is nearly absent. Laser Induced Fluorescence (LIF) and Two-Photon Absorption LIF (TALIF) line imaging are used for in situ measurements of two-dimensional spatial distributions of absolute OH and H atom number density distributions in near-surface repetitive nanosecond pulse discharge plasma over distilled water surface in argon buffer. Measurement results after a burst of 20 discharge pulses at a pulse repetition rate of 1 kHz demonstrated that peak H number density, [H] = 2・10~(16) cm~(-3), is much higher compared to peak OH number density, [OH] = 3・10~(14) cm~(-3). Highest OH number density was measured in the region where plasma emission peaks, while H atoms convect downstream with the flow and diffuse further away from the surface, compared to OH.
机译:本实验为重复纳秒脉冲中的表面电荷动力学,石英和蒸馏水表面持续的表面电离波放电提供了新的见解。在低脉冲重复频率(〜100 Hz)下,石英表面和蒸馏水表面的残留表面电荷密度分别不超过放电脉冲峰值的〜10%和〜25-30%,除了数据取自高压电极的表面电离波的最大范围附近,此时波幅变得相当低。与耦合到等离子体的能量相比,这相当于表面上存储的能量的〜1%和〜5-10%。在蒸馏水表面上的放电中,表面电荷沉积更为明显,残余表面电荷密度较高,并且其衰减相当慢。但是,存储在表面上的净放电能量分数仍然很低,并且在脉冲后几微秒内,表面电荷几乎被完全中和。在高脉冲重复频率(约10 kHz)下,由交替极性脉冲序列维持的电离波放电会导致由下一个相反极性的脉冲中和前一个脉冲所沉积的表面电荷。在石英表面和蒸馏水表面的放电中都可以观察到这种效果。在由相同极性脉冲序列维持的石英表面放电中,没有检测到多个脉冲上明显的残留表面电荷积聚。在由相同极性脉冲串维持的蒸馏水表面上方的放电中,对于负极性脉冲,在多个脉冲上检测到大量的剩余表面电荷积聚,而几乎不存在针对正极性脉冲的影响。激光诱导荧光(LIF)和双光子吸收LIF(TALIF)线成像用于原位测量蒸馏水上近表面重复纳秒脉冲放电等离子体中绝对OH和H原子数密度分布的二维空间分布表面在氩气缓冲液中。在以1 kHz的脉冲重复频率突发20个放电脉冲后的测量结果表明,峰H数密度[H] = 2 ・ 10〜(16)cm〜(-3)比峰OH数高得多密度,[OH] = 3·10〜(14)cm〜(-3)。与OH相比,在等离子发射达到峰值的区域中测量到最高的OH数密度,而H原子随流动对流并向下游扩散并进一步远离表面扩散。

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