首页> 外文会议>International annual conference of ICT >Stability and characterization of GAP bonded ADN-propellant - the problem of gas formation during curing with isocyanates
【24h】

Stability and characterization of GAP bonded ADN-propellant - the problem of gas formation during curing with isocyanates

机译:GAP键合的ADN推进剂的稳定性和特性-异氰酸酯固化过程中气体形成的问题

获取原文

摘要

During the development of a GAP-ADN formulations in the framework of HISP~*) - program a porous structure in the formulations was encountered. The pores are caused by gas formation during curing of the propellant mix, in some part also already mixing or kneading. This pore formation is very disadvantages with respect to mechanical properties and burning behaviour. The conditions of pore formation and the possible causes should be clarified in order to avoid or at least to reduce the pore formation below a critical extent. The origin of the gas formation was assumed to result in decomposition of ADN itself or the reaction between ADN and the isocyanate Desmodur™ E503, which was used to form the polyurethane based binder in the formulation. Mainly gas evolution at several temperatures, 50°C, 60°C and 70°C at function of measurement time was used to characterize the gas evolution rates. Besides Desmodur™ E503 also the isocyanate IPDI (iso-phorone diisocyanate) was included in this investigation. The gas evolution was followed with two methods. One was IR absorption of the concentration increase of N_2O, a decomposition product of AND. This was done only with E503, because of to high vapour pressure of IPDI. The other method was the determination of the total gas evolution using the vacuum stability apparatus produced by Czech company OZM, which follows the gas pressure by pressure transducers. With IPDI also the anomalous decomposition behaviour of ADN was observed. The obtained results suggest that the decomposition of ADN is the cause of the gas formation and that the control of temperature during propellant preparation, mix and especially curing, plays a key role to avoid the formation of bubbles and pores in the cured formulation.
机译:在HISP- *)框架下开发GAP-ADN配方时,遇到了程序中的多孔结构的问题。孔隙是由推进剂混合物固化过程中的气体形成引起的,在某些情况下也已经混合或捏合。就机械性能和燃烧性能而言,这种孔的形成是非常不利的。为了避免或至少将孔的形成降低到临界程度以下,应阐明孔的形成条件和可能的原因。据推测,气体形成的起因会导致ADN本身分解或ADN与异氰酸酯Desmodur™E503之间的反应,该反应用于在配方中形成聚氨酯基粘合剂。主要使用在测量时间函数下在几个温度(50°C,60°C和70°C)下的气体逸出来表征气体逸出速率。除Desmodur™E503外,该研究还包括异氰酸酯IPDI(异佛尔酮二异氰酸酯)。用两种方法跟踪气体逸出。一个是IR吸收了AND的分解产物N_2O的浓度增加。由于IPDI的蒸气压高,因此只能使用E503进行此操作。另一种方法是使用捷克OZM公司生产的真空稳定装置确定总气体逸出量,该装置通过压力传感器跟踪气体压力。使用IPDI,也观察到ADN的异常分解行为。所得结果表明,ADN的分解是气体形成的原因,并且在推进剂制备,混合,尤其是固化期间的温度控制在避免固化制剂中形成气泡和孔隙方面起着关键作用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号