Mechanical and Cathodic Delamination Inhibiting Properties of Atmospheric Pressure Plasma Polymerized HMDSO

摘要

Atmospheric-pressure plasma is an effective way to deposit a thin silicon dioxide layer onto various substrates. The properties of the film are very sensitive to the experiment conditions. Under careful control, films of good quality can be deposited. As the film thickness increases, the hardness and modulus decrease, however the CDL inhibition improves with increasing film thickness. Therefore films with good mechanical properties for most protection coating applications (hard and scratch resistant) are not necessarily ideal for CDL inhibition.