Improving Throughput of Ion Beam Sputtered Optical Films

摘要

Ion Beam Sputtering has been the choice for leading edge optical coating manufacturing for more than three decades. During that time the technology has moved from the scientific lab to high volume production. Market forces continue to drive toward larger volume production of these high quality films. In order to meet these needs, increases in deposition rate and substrate lot size are required while maintaining the superior quality expected from ion beam sputtered films. The latest process development at high deposition rates of Ta_2O_5, SiO_2 and Nb_2O_5 are shown.