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Sensing Characteristics of a Novel NH{sub}3-Nitrided Schottky-Diode Hydrogen Sensor

机译:一种新型NH {Sub} 3氮化肖特基二极管氢传感器的感测特性

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A novel NH{sub}3-nitrided Schottky-diode hydrogen sensor has been successfully fabricated Measurements have been performed to investigate the sensitivity, stability and response speed of the sensor at different temperatures and hydrogen concentrations. It can respond to hydrogen variation very quickly and can give significant response even at low hydrogen concentration. The studied device exhibits high sensitivity of 350% at 300°C when 800 ppm H{sub}2 in N{sub}2 gas is introduced. The sensitivity is 15 times greater than that of the Pt-SiC sensor. The excellent hydrogen-sensing characteristics of this novel sensor make it very suitable for detecting hydrogen leakage in high-temperature environment. The effects of hydrogen adsorption on the barrier height and hydrogen reaction kinetics are also investigated.
机译:已经成功地制造了一种新的NH {Sub} 3氮化肖特基二极管氢传感器,以研究在不同温度和氢浓度下传感器的灵敏度,稳定性和响应速度进行测量。它可以非常快地响应氢变化,并且即使在低氢浓度下也可以产生显着的反应。当引入N {} 2气中的800ppm H {亚} 2时,所研究的装置在300℃下表现出350%的高灵敏度。灵敏度是PT-SIC传感器的15倍。该新型传感器的优异氢感特性使其非常适合检测高温环境中的氢漏。还研究了氢吸附对屏障高度和氢气反应动力学的影响。

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