Fourier transform infrared spectra; Raman spectra; amorphous semiconductors; elemental semiconductors; hydrogen; multilayers; nanostructured materials; plasma CVD; silicon; silicon compounds; thin films; ultraviolet spectra; visible spectra; FTIR spectroscopy; Raman spectroscopy; SEM; Samco PD 220 NA PECVD system; Si:H-Sisub3/subNsub4/sub; SiN:H; TEM; UV-vis spectrophotometry; X-ray diffraction; corning eagle 2000 glass; dielectric matrix; multilayered films; spectroscopic ellipsometry; temperature 700 degC to 1100 degC; thin films; Annealing; Films; Nitrogen; Photonic band gap; Plasma temperature; Silicon; X-ray diffraction;
机译:Tb
机译:<![CDATA [解决方案阶段的电气和光学属性存放为
机译:“> O
机译:从A-Si:H转变为Si
机译:安全困境的逻辑:INF条约谈判的言语行为分析。
机译:趋磁细菌中磁铁矿(Fe(inf3)O(inf4))和钙铁矿(Fe(inf3)S(inf4))的受控生物矿化
机译:O