Multiple spectrum analysis and evaluation for optical constants of HfO_2 thin films

摘要

HfO_2 thin films were deposited on ZS1 silica by Ion Beam Sputtering (IBS) technique. Optical constants of HfO_2 thin films were obtained by multiple spectrum analysis method, which combined the transmittance spectrum and ellipsometry spectrum of the film. The refractive index and extinction coiefficient of HfO_2 thin films were evaluated by etching experiments of the film. The analysis spectral range was between 250nm and 850nm.