Diffractive optical elements: fabrication and application

摘要

We review our recent progress on development of the methods for fabrication of precision binary and as well as high-efficiency continuous-relief diffractive optical elements (DOEs) by combining complementary advantages of circular laser writing system (CLWS), direct laser beam writing in thermal and photo-sensitive materials and analog lithography. The main limitation and tolerances of writing methods are identified, and their influence on optical performance of DOEs is investigated. The latest results of fabrication and practical applications of DOEs with more than 200 mm diameter and a minimum feature size of 0.5 micrometer for testing large aspheric surfaces with a Fizeau-type interferometer are presented.