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Research on the magnetorheological finishing (MRF) technology with dual polishing heads

机译:双抛光头磁流变抛光技术的研究

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Magnetorheological finishing (MRF) is a key polishing technique capable of rapidly converging to the required surface figure. Due to the deficiency of general one-polishing-head MRF technology, a dual polishing heads MRF technology was studied and a dual polishing heads MRF machine with 8 axes was developed. The machine has the ability to manufacture large aperture optics with high figure accuracy. The large polishing head is suitable for polishing large aperture optics, controlling large spatial length's wave structures, correcting low-medium frequency errors with high removal rates. While the small polishing head has more advantages in manufacturing small aperture optics, controlling small spatial wavelength's wave structures, correcting mid-high frequency and removing nanoscale materials. Material removal characteristic and figure correction ability for each of large and small polishing head was studied. Each of two polishing heads respectively acquired stable and valid polishing removal function and ultra-precision flat sample. After a single polishing iteration using small polishing head, the figure error in 45mm diameter of a 50 mm diameter piano optics was significantly improved from 0.21λ to 0.08λ by PV (RMS 0.053λ to 0.015λ). After three polishing iterations using large polishing head , the figure error in 410mm×410mm of a 430mm×430mm large piano optics was significantly improved from 0.40λ to 0.10λ by PV (RMS 0.068λ to 0.013λ) .This results show that the dual polishing heads MRF machine not only have good material removal stability, but also excellent figure correction capability.
机译:磁流变抛光(MRF)是一项关键的抛光技术,能够迅速收敛到所需的表面形状。由于通用单抛光头MRF技术的不足,研究了一种双抛光头MRF技术,并开发了一种八轴双抛光头MRF机。该机器具有制造具有高精度图形的大口径光学器件的能力。大型抛光头适用于抛光大孔径光学器件,控制较大空间长度的波结构,以高去除率校正中低频率误差。尽管小抛光头在制造小孔径光学器件,控制小空间波长的波结构,校正中高频和去除纳米级材料方面具有更多优势。研究了大型和小型抛光头的材料去除特性和图形校正能力。两个抛光头分别获得稳定有效的抛光去除功能和超精密平板样品。使用小型抛光头进行单次抛光迭代后,PV(RMS为0.053λ至0.015λ)可将直径为50 mm的钢琴光学器件的45mm直径中的图形误差从0.21λ显着提高至0.08λ。通过使用大型抛光头进行三次抛光迭代,PV(RMS0.068λ至0.013λ)将430mm×430mm大型钢琴光学器件的410mm×410mm的图形误差从0.40λ显着提高到0.10λ,结果表明MRF抛光头不仅具有良好的材料去除稳定性,而且还具有出色的图形校正能力。

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