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Electrical and Electroluminescence Properties of Silicon Nanocrystal/SiO_2 Superlattices

机译:硅纳米晶/ SiO_2超晶格的电和电致发光特性

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The electrical and electroluminescence (EL) properties of Si-rich oxynitride (SRON)/SiO_2 superlattices are studied for different silicon excess and layer thicknesses. The precipitation and crystallization of the Si excess present within the SRON layers is induced by a post-deposition annealing treatment, in order to form Si nanocrystals (Si-NCs). The electrical characterization performed in dark conditions allowed for deducing the charge transport mechanism through the superlattice structure, found to follow the Poole-Frenkel law. In addition, the EL investigation revealed the correlation between EL excitation and transport mechanisms, suggesting that impact ionization of high-energy conduction electrons dominates the whole frame. The reduction of the SiO_2 barrier thickness and the increase in the Si excess were found to enhance the carrier transport through the superlattices due to the reduction of the electrons mean free path, which, in turn, modifies the EL properties.
机译:针对不同的硅过量和层厚度,研究了富硅氮氧化物(SRON)/ SiO_2超晶格的电和电致发光(EL)特性。为了形成Si纳米晶体(Si-NC),通过沉积后退火处理来诱导存在于SRON层中的过量Si的沉淀和结晶。在黑暗条件下进行的电学表征可以推论通过超晶格结构的电荷传输机制,该结构遵循普尔-弗伦克定律。此外,EL研究揭示了EL激发和传输机制之间的相关性,表明高能传导电子的碰撞电离作用主导着整个框架。 SiO 2势垒厚度的减小和Si过量的增加被发现由于电子平均自由程的减小而增强了通过超晶格的载流子传输,这反过来又改变了EL性能。

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