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A Novel Fan-Out Concept for Ultra-High Chip-to-Chip Interconnect Density with 20-μm Pitch

机译:一种新的扇出概念,用于超高芯片到芯片互连密度,具有20μm间距

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The rapid growth of data bandwidth required between logic and memory chips for next generation device nodes is progressively pushing low I/O count serial busses to their limits. To further satisfy this increasing need for high data rates, wider I/O count busses are now being developed and established. Over the past years, various Fan-Out Wafer-Level-Packaging (FOWLP) approaches have been developed to answer the needs mentioned above and the increasingly demanding function integration on package. Imec has been working on a novel 300mm Fan-Out Wafer-Level-Packaging concept that enables 20μm pitch interconnect density. Results from experiments demonstrates wafer bow below 500μm after molding on silicon substrate with ultra-low die shift with maximum die to carrier mismatch below 10μm on full 300mm wafers. Further warpage and die shift evolution are expected depending on the process steps the wafers must go through and will be further discussed.
机译:下一代设备节点的逻辑和存储器芯片所需的数据带宽的快速增长逐步将低I / O计数串行总线推向它们的限制。为了进一步满足这种越来越多的高数据速率需求,现在正在开发和建立更广泛的I / O计数总线。在过去几年中,已经开发出各种扇出晶圆级包装(FOWLP)方法来回答上述需求以及越来越苛刻的函数集成在包上。 IMEC一直在新颖的300mm扇出晶圆级包装概念,该概念使得能够实现20μm互连密度。实验结果在用最大管料上成型后,在硅衬底上成型后,在硅衬底上模制后的晶片弓,在全300mm晶片上以低于10μm的载体不匹配。预期晶圆必须经过的过程步骤,预期进一步的翘曲和模具换档进化将进一步讨论。

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