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Evidence of charge carrier number fluctuations in InN thin films?

机译:Inn薄膜中的收费载波号波动的证据吗?

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Due to its small band-gap and its high mobility, InN is a promising material for a large number of key applications like band-gap engineering for high efficiency solar cells, light emitting diodes, and high speed devices. Unfortunately, it has been reported that this material exhibits strong surface charge accumulation which may depend on the type of surface. Current investigations are conducted in order to explain the mechanisms which govern such a behavior and to look for ways of avoiding it and/or finding applications that may use such an effect. In this framework, low frequency noise measurements have been performed at different temperatures on patterned MBE grown InN layers. The evolution of the 1/f noise level with temperature in the 77 K-300 K range is consistent with carrier number fluctuations thus indicating surface mechanisms: the surface charge accumulation is confirmed by the noise measurements.
机译:由于其小带隙及其高移动性,INN是大量关键应用的有希望的材料,如高效太阳能电池,发光二极管和高速装置的带隙工程。遗憾的是,据报道,该材料表现出强大的表面电荷积累,这可能取决于表面的类型。进行目前的调查,以解释管理这种行为的机制,并寻找避免它和/或发现可能使用此类效果的应用程序的方法。在该框架中,在图案化的MBE成长衣架层上的不同温度下进行了低频噪声测量。在77k-300k范围内的温度的1 / f噪声水平的演变与载波数波动一致,从而指示表面机构:表面电荷累积通过噪声测量确认。

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