Silver surface-enhanced raman scattering substrates prepared by a nanofabrication process using Electron Beam Lithography and magnetron sputtering

摘要

The tunable silver nano-pillar arrays were fabricated by using Electron Beam Lithography and direct current magnetron sputtering technique successfully. The as-prepared substrates retain an excellent Raman-enhancement characteristic. The developed process provides a reproducible and reliable method to fabricate the Surface-enhanced Raman Scattering substrate particularly for the high sensitivity biological detections.