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Evolution of Microstructure and Nanomechanical Behavior of Diamond-Like Carbon Films at High Temperature Annealing

机译:高温退火中金刚石碳膜膜微观结构和纳米力学行为的演变

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The microstructure and nanomechanical behavior of diamond like carbon (PLC) films has been investigated at high temperature annealing. The DLC films with 250 nm thickness were, deposited on the crystalline silicon (c-Si) substrate using ultra-high-vacuum ion beam sputtering and post thermal annealing at high temperature up to 900 °C for 0.5-1.5 hours. Raman spectra showed that the as-deposited DLC film contained tetrahedral amorphous carbon (ta-C) state and presence of increased sp~2 bonds after annealing 'at 900 °C. GIXRD spectra obtained for the DLC films indicated the absence of diffraction peaks at room temperature (RT) and varied vacuum annealing conditions. It indicates that the above DLC films -are still amorphous at high thermal stability despite the change of bonding behaviour from primary sp~3 to more sp~2 bonding. The nanohardness and elastic modulus of the DLC films measured by continuous stiffness measurement technique in the nanoindentation decreased significantly from 29.6 and 351.2 GPa at RT to 17.5 and 150 GPa at 900°C, respectively which has been attributed to the graphitization of DLC films at high temperature.
机译:微观结构和类似的碳(PLC)薄膜金刚石的纳米机械行为已经在高温下退火了研究。用250米纳米厚的DLC膜,沉积在晶体硅在高温下使用的超高真空离子束溅射和后热退火(C-Si)衬底到900℃下进行0.5〜1.5小时。拉曼光谱表明所沉积的DLC膜包含四面体无定形碳(TA-C)的状态,并在退火之后在900℃下SP增加〜2个键”的存在。 GIXRD光谱获得的DLC膜表明不存在在室温(RT)和改变真空退火条件的衍射峰。这表明,在上述DLC膜-are仍然在高的热稳定性,尽管无定形的粘结性能,从主SP〜3更SP〜2键合的改变。通过连续刚性的测量技术在纳米压痕测量的DLC薄膜的纳米硬度和弹性模量从29.6显著下降和351.2 GPA在RT至17.5和为150GPa分别在900℃,这已归因于DLC膜中的高石墨化温度。

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