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Continuing to shrink: Next-generation lithography - Progress and prospects

机译:持续缩小:下一代光刻-进展与前景

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Chip makers are increasingly concerned about the shrink and cost. This concern drives different lithography solutions for different products. Two major trends can be observed: aggressive adoption of EUV, or aggressive extension of immersion. Further cost reduction could be achieved by introducing 450mm wafers.
机译:芯片制造商越来越关注其缩小和成本。这种担忧推动了针对不同产品的不同光刻解决方案。可以观察到两个主要趋势:积极采用EUV或积极扩展浸入式。通过引入450mm晶圆,可以进一步降低成本。

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