Diffraction Gratings with Anticorrelated Relief for New Surface Plasmon Polariton Photodetectors Sensors

摘要

In this work new method for diffraction grating formation are suggested. This method allows to produce periodically corrugated thin metal films with transmittance strongly depends on the mutual correlation of two metal film interfaces with air and semiconductor. This could be the final stage of manufacturing of this type photodetector when all elements and circuits on the chip (like CCD matrix) are already formed.