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Preparation and Characterization of High Quality Lead-free BiFeO3 Thin Films by Sputtering Process

机译:通过溅射工艺制备高质量无铅BIFEO3薄膜的制备与表征

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BiFeO3 (BFO) thin films have been prepared on SrTiO3 (001) single crystal substrates by sputtering process which is suitable for mass production. Domain structure can be controlled by off-cut angle and direction of SrTiO3 substrates. A lateral PFM and a XRD reciprocal space mapping results reveal the BFO thin film on SrTiO3 (001) with 4o off-cut along [110] is single domain. The single domain BFO shows well-saturated ferroelectric D-E hysteresis loops at R.T.
机译:通过溅射工艺在SRTIO3(001)单晶基板上制备BifeO3(BFO)薄膜,该溅射工艺适用于批量生产。 域结构可以通过脱纸角度和SRTIO3基板的方向来控制。 横向PFM和XRD往复空间映射结果显示SRTIO3(001)上的BFO薄膜,40沿[110]是单一结构域。 单域BFO在R.T显示饱和的铁电D-E滞后环。

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