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Low temperature cure of BCB and the influence on the mechanical stress

机译:BCB的低温固化及其对机械应力的影响

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Thin film polymers play an essential role in system integration. The curing temperature and the mechanical stress of the polymers are crucial for 3D-Integration. Low temperature cure is beneficial because the risks of damaging parts of integrated components like MEMS/MOEMS and memory chips or interconnections based on low temperature solders are reduced. A high mechanical stress in the polymer layer on top of a Si wafer can result in a large wafer/chip bow. This is a very important aspect if the wafers are thinned to less than 150 μm for the application of Si interposer or other 3D-integration techniques. In contrast to most of the PIs and PBOs BCB can be cured below 250°C. In this paper low temperature curing profiles similar to Epoxy cure have been performed. The degree of cure was measured by FT-IR-spectroscopy to guarantee the stability of the films for further processing. An 80% degree of polymerization was set as a minimum value. The curing mechanism was controlled by DSC. Based on this result a new BCB curing model can be postulated which helps to predict the degree of cure for different curing profiles. In contrast to the literature published the last 15 years this model is based on a 2-step polymerization mechanism which is much more accurate for the polymerization above 80%. Curing BCB at lower temperature helps to reduce the mechanical stress in the film. The stress was measured by wafer bow for different curing profiles. Tensile tests using 13 μm free-standing BCB-films which have been cured using different curing profiles were performed to measure the elongation to break, tensile strength and the Young''s Modulus. Additionally, there was a viscoelastic stress relaxation process in the BCB layer explored, which until today has never been described in literature. This relaxation is an important aspect of the simulation of BCB-based buildups. This paper is therefore a comprehensive study of the mechanical properties of BCB in relati--on to the curing process with a focus on a temperature range below 200°C.
机译:薄膜聚合物在系统集成中起着至关重要的作用。聚合物的固化温度和机械应力对于3D集成至关重要。低温固化是有益的,因为降低了损坏集成组件(例如MEMS / MOEMS)和存储芯片或基于低温焊料的互连的部件的风险。 Si晶圆顶部的聚合物层中的高机械应力会导致较大的晶圆/芯片弯曲度。如果将晶片减薄至小于150μm以用于Si中介层或其他3D集成技术,则这是非常重要的方面。与大多数PI和PBO相比,BCB可以在250°C以下固化。在本文中,已经执行了类似于环氧树脂固化的低温固化特性。通过FT-IR光谱法测量固化度以确保膜的稳定性以用于进一步加工。将80%的聚合度设定为最小值。固化机理由DSC控制。基于此结果,可以假定一个新的BCB固化模型,该模型有助于预测不同固化曲线的固化程度。与最近15年发表的文献相反,该模型基于两步聚合机制,对于80%以上的聚合,该机制更为精确。在较低温度下固化BCB有助于减少薄膜中的机械应力。通过晶片弯曲测量不同固化曲线的应力。使用已使用不同固化曲线固化的13μm独立BCB膜进行拉伸测试,以测量断裂伸长率,拉伸强度和杨氏模量。此外,在探索的BCB层中存在粘弹性应力松弛过程,直到今天,文献中从未对此进行描述。这种松弛是模拟基于BCB的堆积的重要方面。因此,本文对BCB的力学性能进行了全面的研究。 -- 着重于低于200°C的温度范围的固化过程。

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