首页> 外文会议>61st Electronic Components Technology Conference, 2011 >Ultra-high I/O density glass/silicon interposers for high bandwidth smart mobile applications
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Ultra-high I/O density glass/silicon interposers for high bandwidth smart mobile applications

机译:适用于高带宽智能移动应用的超高I / O密度玻璃/硅中介层

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Smart mobile applications are driving the demand for higher logic-to-memory bandwidth (BW) in 10–30 GB/s range with lower power consumption and larger memory capacity. This paper presents a radically-different, scalable and lower cost approach than the 3D ICs with TSV stack approach being pursued widely, to achieve high bandwidth. This approach is referred to as interposer approach using ultra-thin glass or silicon with ultra-high I/O density interposers, which does not require TSVs in the logic IC in the 3D stack. This paper presents a comparative study, based on electrical modeling of the logic-to-memory signal path, in various current and emerging package configurations for use in smart mobile devices. Frequency and time domain analysis for each of these scenarios is performed using both chip and package-level models with varying interconnection dimensions. Simulated eye diagrams for the complete data paths in the thin glass interposer approach demonstrated more than 3 Gbps/pin data rate, similar to 3D ICs.
机译:智能移动应用正在推动对10至30 GB / s范围内更高的逻辑到内存带宽(BW),更低的功耗和更大的存储容量的需求。本文提出了一种与3D IC截然不同,可扩展且成本更低的方法,这种3D IC具有广泛采用的TSV堆叠方法,以实现高带宽。这种方法称为插入器方法,该方法使用超薄玻璃或硅以及超高I / O密度插入器,在3D堆栈中的逻辑IC中不需要TSV。本文基于逻辑到内存信号路径的电气建模,针对在智能移动设备中使用的各种当前和新兴封装配置,进行了一项比较研究。使用具有不同互连尺寸的芯片级和封装级模型对每种情况进行频域和时域分析。薄玻璃插入器方法中完整数据路径的仿真眼图展示了超过3 Gbps /引脚的数据速率,类似于3D IC。

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