CHANGES IN CONTACT RESISTANCE OF DIFFERENT METALS TO MAGNETRON SPUTTERED ITO WHILE ANNEALING

摘要

In this work we compare the contact formation of silver, aluminium, chrome, titanium, nickel, palladium, and copper on magnetron sputtered indium tin oxide (ITO) and the change of the contact resistance during a low temperature annealing step. Test structures after Schroder and Meier were prepared to measure the sheet resistance of the ITO layers on glass, as well as the specific contact resistance between ITO and the metal. We saw for all metals besides aluminium no significant changes in the contact resistance after annealing. The sheet resistances of the ITO layers changed after the annealing depending on the base pressure before starting the sputter process. No significant changes in the optical properties of the ITO layers could be observed.