ELECTRON-BEAM CRYSTALLIZATION OF AMORPHOUS SILICON THIN FILMS DEPOSITED BY DC-SPUTTERING METHOD FROM SI:B SINGLE TARGET

机译：直流溅射法从SI：B单靶沉积非晶硅薄膜的电子束结晶化

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The electron beam annealed silicon absorber layer for solar cell is investigated. 1μm-thick p-typeamorphous silicon (p-a-Si) layer was deposited using DC sputtering system. Each sample was annealed usingelectron beam in various conditions for crystallization. electrical and structural properties of annealed samples werecharacterized by X-ray diffraction (XRD), Hall effect measurement, Raman photoluminescence

机译：研究了用于太阳能电池的电子束退火硅吸收层。 1μm厚的p型使用DC溅射系统沉积非晶硅（p-a-Si）层。每个样品使用电子束在各种条件下结晶。退火样品的电学和结构性能分别为通过X射线衍射（XRD）表征，霍尔效应测量，拉曼光致发光

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《European Photovoltaic Solar Energy Conference and Exhibition》|2011年|2807-2809|共3页
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Hyeonsik Na; Dongwook Lee; Yeonjo Choi; Chaehwan Jeong;
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Polycrystalline Si; Thin Film Solar Cell; Electron-beam-annealing; Crystallization;

机译：多晶硅;薄膜太阳能电池;电子束退火;结晶;

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1. Large-grain poly-crystalline silicon thin films prepared by aluminum-induces crystallization of sputter-deposited hydrogenated amorphous silicon [J] . Maruf Hossain, Harry M. Meyer, Husam H. Abu-Safe Journal of Materials Research . 2006,第3期

机译：铝制备的大晶粒多晶硅薄膜诱导溅射沉积的氢化非晶硅结晶
2. Electrochemically Deposited Pd-Induced Crystallization of Parallel Needlelike Polycrystalline Silicon from Prepatterned Amorphous Silicon Thin Films [J] . C. W. Chao, G. R. Hu, Y. S. Wu Electrochemical and solid-state letters . 2002,第2期

机译：预先沉积的非晶硅薄膜对平行针状多晶硅的电化学沉积钯诱导结晶
3. Room temperature photoluminescence spectrum modeling of hydrogenated amorphous silicon carbide thin films by a joint density of tail states approach and its application to plasma deposited hydrogenated amorphous silicon carbide thin films [J] . Kivanc Sel, Ibrahim Guenes Thin Solid Films . 2012,第24期

机译：尾态联合密度法研究氢化非晶碳化硅薄膜的室温光致发光光谱及其在等离子体沉积氢化非晶碳化硅薄膜中的应用
4. THIN FILM TRANSISTORS FABRICATED IN LASER-CRYSTALLIZED CHEMICALLY VAPOR DEPOSITED AMORPHOUS SILICON FILMS ON QUARTZ SUBSTRATES [C] . D. N. Kouvatsos, A. T. Voutsas, G. J. Papaioannou Proceedings vol.2005-09; European Conference on Chemical Vapor Deposition(EURCVD-15); 20050905-09; Bochum(DE) . 2005

机译：石英衬底上激光沉积化学气相沉积的非晶硅薄膜制成的薄膜晶体管
5. A novel nonlithographic method to fabricate nanoparticles and its application in crystallization of amorphous silicon thin films. [D] . Shen, Wen. 2010

机译：一种新颖的非光刻方法制造纳米粒子及其在非晶硅薄膜结晶中的应用。
6. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon [O] . Sonia Ben Slama, Messaoud Hajji, Hatem Ezzaouia 2012

机译：通过PECVD在镍金属化多孔硅上沉积的非晶硅薄膜的结晶
7. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon [O] . 2012

机译：通过PECVD在镍金属化多孔硅上沉积的非晶硅薄膜的结晶

ELECTRON-BEAM CRYSTALLIZATION OF AMORPHOUS SILICON THIN FILMS DEPOSITED BY DC-SPUTTERING METHOD FROM SI:B SINGLE TARGET

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