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Antireflective subwavelength gratings on the end faces of optical fibers fabricated by UV nanoimprint lithography

机译:通过UV纳米压印光刻技术在光纤端面上制备抗反射亚波长光栅

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摘要

Antireflective subwavelength gratings (SWGs) with binary cross-sectional shapes were fabricated on the end faces of optical fibers by using UV nanoimprint lithography. A dedicated UV nanoimprinting machine to press the tip of an optical fiber to a mold was developed. The SWGs with the periods of 700 nm were fabricated at the tips of optical fibers. Their optical characteristics were measured.
机译:通过使用紫外线纳米压印光刻技术,在光纤的端面上制作了具有二元截面形状的抗反射亚波长光栅(SWGs)。开发了一种专用的紫外线纳米压印机,用于将光纤尖端压到模具上。在光纤尖端制作了周期为700 nm的SWG。测量了它们的光学特性。

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