首页> 外文会议>2011 12th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices >Effect of As2 and As4 fluxes on the morphology of GaSb(001) surface during growth of GaSb/InAs heterojunction by MBE
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Effect of As2 and As4 fluxes on the morphology of GaSb(001) surface during growth of GaSb/InAs heterojunction by MBE

机译:MBE生长GaSb / InAs异质结过程中As 2 和As 4 通量对GaSb(001)表面形貌的影响

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Interaction of GaSb(001) surface with fluxes of As2, As4 and Sb4 molecules was investigated on the basis of the reflection high energy electron diffraction (RHEED) method. Exposure of GaSb surface to As2 and As4 fluxes results in substitution of antimony atoms by arsenic atoms. It is shown that As2 molecules interact with GaSb surface mostly on the basis of the direct substitution mechanism, while As4 molecules interact with it on the basis of the vacancy mechanism. It has been found that for reproducible generation of In-Sb heteroboundaries in InAs/GaSb super-lattices it is necessary to use As4 flux rather than As2 one. The research results have allowed optimizing the technology for growth of short-period InAs/GaSb superlattices that have high potential for development of IR photodetectors.
机译:基于反射高能研究了GaSb(001)表面与As 2 ,As 4 和Sb 4 分子通量的相互作用电子衍射(RHEED)方法。 GaSb表面暴露于As 2 和As 4 通量会导致锑原子被砷原子取代。结果表明,As 2 分子与GaSb表面的相互作用主要是基于直接取代机理,而As 4 分子与空位机理则是与其相互作用。已经发现,为了在InAs / GaSb超晶格中可再现地生成In-Sb异质边界,有必要使用As 4 通量而不是As 2 通量。研究结果使优化用于In-GaAs / GaSb超晶格超晶格生长的技术得以优化,这些InAs / GaSb超晶格具有开发IR光电探测器的巨大潜力。

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