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Effects of Direct Current and Pulse Electrodeposition Parameters on the Properties of Nano Cobalt Coatings

机译:直流电和脉冲电沉积参数对纳米钴涂层性能的影响

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The aim of this study was to investigate the effects of direct current (DC) and pulse current (PC) parameters on the properties of cobalt (Co) coatings electrodeposited from a chloride acidic bath. The effects of peak current density, frequency and duty cycle on the surface morphology, crystal size, thickness, current efficiency, and preferred orientation of the deposits were investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The experimental thickness of the deposit was lower for pulse plating compared to that of DC plating. The current efficiency was comparatively higher for pulse plating. Less porosity and fine grains were formed by pulse plating. From XRD analysis, the calculated grain sizes of nano and micro Co coatings were around 65nm and 430nm, respectively. The results showed that, with an increase in duty cycle, grain sizes would increase, too. As pulse frequency was increased to 50Hz, grain sizes would also decrease. However, at higher frequencies, grain sizes would increase again.
机译:这项研究的目的是研究直流(DC)和脉冲电流(PC)参数对从氯化物酸性浴中电沉积的钴(Co)涂层的性能的影响。通过扫描电子显微镜(SEM)和X射线衍射(XRD)研究了峰值电流密度,频率和占空比对表面形貌,晶体尺寸,厚度,电流效率以及沉积物优选取向的影响。与直流电镀相比,脉冲电镀的沉积物实验厚度要低。脉冲电镀的电流效率相对较高。通过脉冲电镀形成较少的孔隙率和细晶粒。根据XRD分析,计算得出的纳米Co和微米Co涂层的晶粒尺寸分别约为65nm和430nm。结果表明,随着占空比的增加,晶粒尺寸也会增加。随着脉冲频率增加到50Hz,晶粒尺寸也将减小。但是,在较高的频率下,晶粒尺寸将再次增加。

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