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Effects of PACVD parameters including pulsed direct current and deposition time on nanostructured carbon coating deposited on carbon fiber fabrics

机译:PACVD参数(包括脉冲直流电和沉积时间)对沉积在碳纤维织物上的纳米结构碳涂层的影响

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摘要

A nanostructured carbon film was deposited on carbon fiber fabrics by plasma assisted chemical vapor deposition (PACVD) to overcome the limitations of carbon fibers and improve the interface with the composites in the carbon fiber fabrics. The main process parameters investigated were the intensity of the pulsed direct current and deposition time on the chemical and structural features of the coating. Methane gas was used as the reactant gas in PACVD. FESEM images revealed good uniformity of the deposited coating. The thickness of the coating varied from 40 to 320 nm for different specimens and the thickness increased as the intensity of the pulsed direct current and deposition time increased. Raman spectroscopy results showed that increasing the magnitude of the pulsed direct current increased the fraction of sp(3) bonds and the residual stress. Diamond nanoparticles 10-20 nm in size were revealed after etching. Increasing the pulsed direct current created a smoother surface with 45.59 nm of average roughness. Depositing a thin coating (40 nm) increased fracture strength 27.6%; however, the fracture strength decreased significantly with further increases in the thickness of the coating. (C) 2016 Elsevier Ltd. All rights reserved.
机译:通过等离子体辅助化学气相沉积(PACVD)将纳米结构的碳膜沉积在碳纤维织物上,以克服碳纤维的局限性并改善与碳纤维织物中复合材料的界面。研究的主要工艺参数是脉冲直流电的强度和沉积时间对涂层化学和结构特征的影响。甲烷气体用作PACVD中的反应气体。 FESEM图像显示了沉积涂层的良好均匀性。对于不同的样品,涂层的厚度从40到320 nm不等,并且随着脉冲直流电流强度和沉积时间的增加,涂层的厚度也增加。拉曼光谱结果表明,增加脉冲直流电的幅度会增加sp(3)键的分数和残余应力。蚀刻后显示出尺寸为10-20 nm的金刚石纳米颗粒。增大脉冲直流电可产生平均粗糙度为45.59 nm的光滑表面。沉积薄涂层(40 nm)可提高断裂强度27.6%;然而,随着涂层厚度的进一步增加,断裂强度显着降低。 (C)2016 Elsevier Ltd.保留所有权利。

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