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Surface modification of SiC mirror by IARE method

机译:通过IARE方法对SiC镜面进行表面改性

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A method to prepare high quality SiC coating at low temperature using large aperture E-beam evaporation PVD equipment with ion assistance was developed for the surface modification of SiC mirror for space projects .This method was called Ion Assisted Reactive Evaporation (IARE). The modified SiC coating was prepared using CH_4 and Si with Kaufman ion source by IARE at 300°C and it had met the requirements of applications. The SiC coating prepared by this method was amorphous. It was dense, homogeneous and easy to be polished. The surface modification of a SiC mirror was carried out using SiC coating by this method and achieved a fine surface modification effect. The surface roughness (rms) of the SiC substrate was reduced to 0.862nm, the scattering coefficient was reduced to 2.79% and the reflectance coated with Ag film was improved simultaneously after the surface modification. The effect of surface modification using SiC coating was close to that of using Si coating. It can be drawn that this technological method to preparation SiC coating for the surface modification of SiC mirror is reasonable and effective.
机译:开发了一种利用离子辅助大口径电子束蒸发PVD设备在低温下制备高质量SiC涂层的方法,用于航天工程SiC镜的表面改性,该方法称为离子辅助反应蒸发(IARE)。改性SiC涂层是由IARE在300°C下用CH_4和Si与Kaufman离子源制备的,满足了应用要求。通过这种方法制备的SiC涂层是无定形的。它致密,均匀且易于抛光。通过该方法使用SiC涂层对SiC反射镜进行表面改性,并且获得了良好的表面改性效果。 SiC衬底的表面粗糙度(rms)降低到0.862nm,散射系数降低到2.79%,并且在表面改性后同时提高了涂有Ag膜的反射率。使用SiC涂层的表面改性效果与使用Si涂层的效果接近。可以看出,这种制备SiC镜面改性用SiC涂层的工艺方法是合理有效的。

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