Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering

摘要

Vanadium oxide films were prepared onto glass and KBr substrates at various deposition temperatures by DC reactive magnetron sputtering. X-Ray photoelectron spectroscopy (XPS), Atomic force microscope (AFM), Fourier transform infrared spectroscopy (FT-IR) were employed to analyze the VOx films, respectively. Experimental results indicated that deposition temperature has a great impact on the surface morphology of vanadium oxide films. The XPS analysis confirmed that the vanadium oxide films prepared are V2O5. From Fourier transform infrared spectroscopy, it can be see that the infrared active mode corresponding to V-O-V stretching vibration and the stretching vibration of unshared V=O bonds appeared at about 840 cm"1 and 915 cm"1 in the films formed at 240 °C, respectively. A shift in the peak position towards higher frequency was found with increasing the deposition temperature which indicated that the films formed at higher deposition temperature were structural disorder.