Study on controlling the profile of holographic ion beam etching gratings

摘要

To alleviate the difficulty in controlling the profile of the photoresist grating mask, advanced segment motion algorithm has been applied to simulate and analyze the evolution of the surface contour in ion beam etching. The simulation indicates that the combination of ion beam etching and reactive ion beam etching can effectively control the duty cycle of the holographic ion beam etching gratings. This has also been validated by the fabrication of four kinds of gratings with different periods (6.66μm, 3.33μm, 2μm, lμm). This finding contributes to the fabrication of the holographic ion beam etching gratings because it helps to simplify the holographic exposure and development.