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Thickness of polycrystalline copper coating measured by X-ray diffraction

机译:用X射线衍射法测量多晶铜涂层的厚度

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Electrodeposition and other methods are employed to obtain metallic turns and coatings. Copper coatings are most extensively used in circuit board industry and often as a base to further formation of other metallic films. Electrodeposited copper films (thin layers) are widely used in electronic and automotive industry so its electrical and mechanical properties and its thickness are important. Several methods are used for thickness determination of thin films and coatings for example mechanical, magnetic and ball crater with light microscopy methods. They are destructive and not precise enough. The X-ray fluorescence, absorption and diffraction are more frequently used due to better precision. Although they are complex and expensive, they pronounce an important feature like non-destructive character. For particular cases geometrical conditions and mathematical calculation procedure must be elaborated. An application of X-ray diffraction in grazing incidence angle for thickness determination is described in this article. The method is based on absorption principles of X-ray beam. The absorption is proportional to thickness of the coating and to incidence and to the diffraction angle which. Geometrical conditions were obtained experimentally and suitable mathematical calculations were introduced. The elaborated methodical approach was applied to thickness determination of copper coatings electrodeposited on a brass substrate.
机译:使用电沉积和其他方法来获得金属匝和涂层。铜涂层在电路板行业中使用最广泛,通常作为进一步形成其他金属膜的基础。电沉积铜膜(薄层)广泛用于电子和汽车工业,因此其电气和机械性能及其厚度非常重要。几种方法用于通过光学显微镜方法确定薄膜和涂层的厚度,例如机械,磁性和球形凹坑。它们具有破坏性,不够精确。由于更好的精度,X射线荧光,吸收和衍射被更频繁地使用。尽管它们复杂且昂贵,但它们却具有重要的特征,例如非破坏性特征。对于特殊情况,必须详细说明几何条件和数学计算程序。本文介绍了X射线衍射在掠入射角用于厚度确定中的应用。该方法基于X射线束的吸收原理。吸收与涂层的厚度,入射角和衍射角成正比。通过实验获得了几何条件,并引入了合适的数学计算。详尽的方法论方法被应用于电沉积在黄铜基板上的铜涂层的厚度测定。

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