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Synthesis of si nanoparticles from freestanding porous silicon (ps) film using ultrasonication

机译:使用超声波从独立的多孔硅(ps)膜合成si纳米颗粒

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Porous Silicon (PS) is one of the established materials and can be used in variety of applications in its different forms. Use of monolayer PS film for synthesis of Si QDs is reported here. Nanometer-sized silicon particles are produced by ultrasonic dispersion of thin films in DI water. PS films are characterized using cross sectional scanning electron microscopy and gravimetric analysis while the Si nanopowder is characterized by Raman spectroscopy, Photoluminescence (PL), UV-visible spectroscopy (UV-vis) and FTIR spectroscopy. Sonication for hours causes breaking and oxidation in the film. This reflects as frequency downshift in Raman spectroscopy. Raman peak are resolved into two peaks to study shell type structure of Si nanopowder synthesized. PL exhibits overall red peak shift. Decreasing Tauc bandgap and sharp absorption edge in UV-vis spectra confirms the presence of oxygenated Si nanoparticles in the material tested, confirmed by FTIR. Analysis of all spectra is explained in terms of shell structured Si nanoparticles with Quantum Confinement Luminescent Centre (QCLC) model.
机译:多孔硅(PS)是已建立的材料之一,可以以不同的形式用于各种应用中。此处报道了单层PS膜用于合成Si QD的用途。纳米尺寸的硅颗粒是通过将薄膜超声分散在去离子水中制成的。使用横截面扫描电子显微镜和重量分析对PS膜进行表征,而通过拉曼光谱,光致发光(PL),紫外可见光谱(UV-vis)和FTIR光谱对Si纳米粉进行表征。数小时的超声处理会导致薄膜破裂和氧化。这反映为拉曼光谱中的频率下降。将拉曼峰分解为两个峰,以研究合成的Si纳米粉的壳型结构。 PL表现出整体红色峰移。 FTIR证实,Tauc带隙的减小和紫外可见光谱的尖锐吸收边缘证实了被测材料中存在氧化的Si纳米颗粒。使用量子限制发光中心(QCLC)模型以壳结构Si纳米颗粒的形式解释了所有光谱的分析。

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