Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the vacuum-arc method

摘要

Influence of nitrogen pressure on silicon content in Ti-Si-N coatings deposited by the va?uum-arc method using Ti0,96–Si0,04 alloy as a consumable cathode materialwas was investigated. It is found out, that the silicon content in coatings regardless of deposition conditions is lower than in the cathode. In pressure range from 5·10⁻⁴ to 10⁻³ Torr, film has minimal silicon content (∼ 0.4 wt. %) and maximal hardness (35 GPa). It is supposed, that the extremum character of coating silicon concentration and hardness dependencies on nitrogen pressure is a result of distinction of structure-phase composition of the coatings obtained at different pressure.