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Investigation of surface properties on Indium Thin Oxide films modified by MirroTron Sputtering system

机译:MirroTron溅射系统修饰的氧化铟薄膜的表面性能研究

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Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.
机译:使用MirrorTron溅射系统在PEN膜上蒸发氧化铟锡(ITO)膜,这是一种新型的溅射系统,能够在低温下进行溅射沉积,将溅射室和沉积室分隔开。结果,能够实现膜厚为150nm的均匀的ITO薄膜沉积。使用聚焦离子束和X射线光电子能谱对ITO薄膜进行化学分析。结果,确认了良好的薄膜条件。

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