首页> 外文会议>Microelectronics and Electron Devices (WMED), 2010 >Discrete Test Structure Device Degradation Analysis and Correlation to NAND Flash Circuit Operation
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Discrete Test Structure Device Degradation Analysis and Correlation to NAND Flash Circuit Operation

机译:离散测试结构器件退化分析及其与NAND闪存电路操作的相关性

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A methodology is established to correlate shifts of test structure device parameters, due to device degradation or process variation, to circuit operation throughout the product lifetime. To the authors' knowledge, this work is original in that SPICE simulation is used, with degraded device models, to relate a circuit timing metric to the degradation of a discrete device used in the circuit. The correlation is validated with actual circuit measurements. In this study, the NAND Flash high-voltage switch circuit is examined in regards to the effect of degrading the p-channel MOSFET used in the circuit. Under standard operating conditions, the device degrades under high electric fields applied across the gate oxide. The method enables the accurate prediction of product lifetime using test structure measurements.
机译:建立了一种方法,以将由于器件性能下降或工艺变化而导致的测试结构器件参数的变化与整个产品生命周期中的电路操作相关联。据作者所知,这项工作是原始的,因为使用SPICE仿真和降级的器件模型将电路时序度量与电路中使用的分立器件的降级相关联。相关性已通过实际电路测量得到验证。在这项研究中,针对降级电路中使用的p沟道MOSFET的影响,研究了NAND​​ Flash高压开关电路。在标准操作条件下,该器件在施加于栅极氧化物上的高电场下会退化。该方法可以使用测试结构测量来准确预测产品寿命。

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