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Power density aware power gate placement optimization scheme

机译:功率密度感知功率门布局优化方案

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As we are marching towards deeper sub-micron technology from process scaling, the transistor leakage itself had became more and more dominant to the total component power, which is unavoidable. Clever employment of power gating / sleep transistor / MTCMOS technology can help to shut off leakage power from un-use blocks. However over placement of power gate cells to reduce ON stage IR voltage drop can yield higher leakage power during OFF stage at high temperature and fast skew. This paper described the circuit analysis, optimization strategies and design methodology to tackle this issue head on. A proposal on power gate placement optimization using the concept of power windowing and Power Perimeter Scan (PPS) was introduced in this paper. Details break down of circuit modeling and design trade off on Power Gating FETs was described including simulation results and equations to aid the illustrations. The overall power saving using MTCMOS was re-evaluated for total leakage minimization.
机译:随着我们从制程规模向更深的亚微米技术迈进,晶体管泄漏本身已越来越占总组件功率的主导地位,这是不可避免的。巧妙地使用电源门控/睡眠晶体管/ MTCMOS技术可以帮助切断未使用模块的泄漏电源。然而,为了降低导通级的功率栅单元的放置而过高,IR电压降会在高温和快速偏斜的关断级期间产生更高的泄漏功率。本文描述了解决该问题的电路分析,优化策略和设计方法。本文提出了一种利用功率窗口和功率周长扫描(PPS)概念优化功率门布局的建议。描述了在功率门控FET上进行电路建模和设计折衷的细节,包括仿真结果和公式以帮助说明。重新评估了使用MTCMOS节省的总功耗,从而将总漏电流降至最低。

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