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System for High Temperature Spectral Emissivity Measurement of Materials for VHTR Applications

机译:用于VHTR应用的材料的高温光谱发射率测量系统

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An experimental system for in situ high temperature measurements of spectral emissivity of VHTR materials has been designed and constructed. The design consists of a cylindrical block of silicon carbide with several machined cavities for placement of test samples, as well as a black body cavity. The block is placed inside a furnace for heating to temperatures up to 1000°C. A shutter system allows for selective exposure of any given test sample for emissivity measurements. An optical periscope guides the thermal radiation from the sample to a Fourier Transform Infra Red (FTIR) spectrometer which is used for real-time measurements of spectral emissivity over a wavelength range of 0.8μm to 10μm. To specifically address the needs of VHTR applications, the system has been designed for studies with VHTR grade helium environments and air transients. Inlet and outlet gas compositions are measured using a gas chromatograph, which in conjunction with ex situ analysis of the samples by electron microscopy and x-ray diffraction will allow for the correlation of surface corrosion of the materials and their spectral emissivities under different operating and accident conditions.
机译:设计并构建了用于高温下测量VHTR材料光谱发射率的实验系统。该设计由一个圆柱形的碳化硅块组成,该块具有几个用于放置测试样品的机加工腔以及一个黑体腔。将该块放置在加热炉内,加热到最高1000°C的温度。百叶窗系统允许选择性地暴露任何给定的测试样品以进行发射率测量。光学潜望镜将来自样品的热辐射引导至傅立叶变换红外(FTIR)光谱仪,该光谱仪用于实时测量0.8μm至10μm波长范围内的光谱发射率。为了专门满足VHTR应用的需求,该系统设计用于VHTR级氦气环境和空气瞬变的研究。入口和出口气体成分使用气相色谱仪进行测量,该色谱仪结合通过电子显微镜和X射线衍射对样品进行的非原位分析,可以使材料的表面腐蚀及其在不同操作和事故下的光谱发射率相关联情况。

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