Effect of Proccess Variable on the Mechanical and Tribological Properties of DC-Reactive Magnetron Sputtering ZrN_x Films Deposited on AlSl D3 and 4140 Steel

摘要

The effect of the process conditions (nitrogen flow and substrate bias voltage- Vb) on the structure and properties of ZrN_x films deposited on AISI-D3 and AISI-4140 tool steel substrates by reactive magnetron sputtering were investigated. Nitrogen flow ratio variations from 1.6% to 4.2% as well as substrate bias voltage changes from -100V to -200V, keeping a constant working pressure of 5mTorr, were set up. Glacing angle X-ray diffraction (GAXRD) was used to examine the crystallographic structure. Results showed a NaCl type cubic structure with (111) orientation corresponding to a 8-ZrN phase, and an increase in lattice parameter is observed as a result of nitrogen flow ratio increment used. Grain texture modification from (111) to a (200) was also observed at -200V bias voltage together with an increase in micro hardness of coated samples compared with uncoated ones, with values from 7.5 to 11.7 GPa for AISI-D3 and 5.5 to 11.4 GPa for AISI-4140 respectively. Also the combined effect of N_2 flow ratio, substrate bias and process temperature on grain size, texture coefficient, film thickness, wear rate, coefficient of friction and film adhesion will be presented.