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Transparent conducting contacts based on zinc oxide substitutionally doped with gallium

机译:基于氧化锌的镓掺杂替代的透明导电触点

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We have employed a high-throughput combinatorial approach to explore a range of Ga doping levels from ≈2–7.5 a.t.% gallium in materials sputtered from ceramic oxide targets on glass substrates. Using our combinatorial approach this compositional spread is examined over a range of substrate temperatures and sputtering atmospheres. Structural, optical, and electrical analysis is then performed using our suite of combinatorial characterization tools. In parallel we have used pulsed laser deposition (PLD) from ceramic targets to produce state of the art Ga:ZnO films on glass at a variety of substrate temperatures for comparison to our combinatorial studies. Our best PLD materials were deposited at a nominal substrate temperature of 300 °C and resulted in a film with a resistivity of 7.7 × 10−5 Ω·cm and transparency in excess of 85% in the visible.
机译:我们采用了一种高通量组合方法,研究了从玻璃基板上的陶瓷氧化物靶溅射出的材料中,镓的掺杂浓度范围从大约2-7.5 a.t.%的镓。使用我们的组合方法,可以在一定范围的基板温度和溅射气氛下检查这种成分分布。然后,使用我们的组合表征工具套件进行结构,光学和电气分析。同时,我们还使用了陶瓷靶材的脉冲激光沉积(PLD)技术,以在各种衬底温度下在玻璃上生产出最先进的Ga:ZnO薄膜,以与我们的组合研究进行比较。我们最好的PLD材料在标称衬底温度为300°C的条件下沉积,形成的薄膜的电阻率为7.7×10 -5 Ω·cm,可见光的透明度超过85%。

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