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Study on the Electrical and Optical Characteristics of a Silicon Electro-optic Waveguide Modulator using MOS Configuration

机译:基于MOS配置的硅电光波导调制器的电和光特性研究

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Active (or tunable) waveguide devices are essential elements to control light for information processing (e.g., coding-decoding, routing, multiplexing, timing, logic operations, etc.) in high-density integrated-optic circuits. In these devices, the complex effective refractive index of the structure is varied in order to produce a phase or intensity modulation. In this paper we study a micron-size metal-oxide-semiconductor (MOS)-based high index-contrast SOI waveguide for highspeed electro-optic modulation on strong light confinement. The light confinement enhances the effect of small index changes on the transmission of the device, enabling an ultracompact structure with high modulation depth. We study the electrical and optical characteristics of this type of silicon electro-optic waveguide modulator using a MOS configuration, and calculate the device's performance for electro-optic modulation with high frequency under different modes of operation of the MOS diode and gate oxide thickness. The studied core Si electro-optic modulation device with high frequency will bring big improvement in the field of optic communication and optic calculation.
机译:有源(或可调谐)波导装置是控制光以在高密度集成光学电路中进行信息处理(例如,编码-解码,路由,复用,定时,逻辑运算等)的基本元件。在这些装置中,结构的复数有效折射率是变化的,以便产生相位或强度调制。在本文中,我们研究了基于微米级金属氧化物半导体(MOS)的高折射率对比度SOI波导,该波导用于在强光限制下进行高速电光调制。光限制增强了折射率变化对设备传输的影响,从而实现了具有高调制深度的超紧凑结构。我们研究了使用MOS配置的这种类型的硅电光波导调制器的电学和光学特性,并计算了在不同的MOS二极管工作模式和栅氧化层厚度下,该器件在高频下进行电光调制的性能。所研究的高频核心硅电光调制装置将在光通信和光计算领域带来巨大的进步。

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