首页> 外文会议>Pacific Rim International Conference on Advanced Materials and Processing(PRICM 5) pt.3 >The structural and photoluminescence character of In As quantum dots grown on a combined InAIAs and GaAs strained buffer layer
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The structural and photoluminescence character of In As quantum dots grown on a combined InAIAs and GaAs strained buffer layer

机译:在InAIAs和GaAs应变缓冲层上生长的In As量子点的结构和光致发光特性

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The structural and photoluminescence (PL) properties of the InAs quantum dots (QDs) grown on a combined InAIAs and GaAs strained buffer layer have been investigated by AFM and PL measurements. The dependence of the critical thickness for the transition from 2D to 3D on the thickness of GaAs layer is demonstrated directly by RHEED. The effects of the introduced-InAlAs layer on the density and the aspect ratio of QDs have been discussed.
机译:通过AFM和PL测量研究了在结合的InAIAs和GaAs应变缓冲层上生长的InAs量子点(QD)的结构和光致发光(PL)特性。 RHEED直接证明了从2D过渡到3D的临界厚度对GaAs层厚度的依赖性。讨论了引入的InAlAs层对量子点的密度和纵横比的影响。

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