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EVAPORATED III-VI SEMICONDUCTOR LAYERS FOR CHALCOGENIDE-BASEDTHIN FILM SOLAR CELLS

机译:用于基于硫族化物的薄膜太阳能电池的蒸发III-VI半导体层

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Various III-VI semiconductor layers have been obtained on glass substrates by In and/or Gaevaporation and subsequent heating in elemental Se or S atmosphere at temperatures between 250 and 400 °C. Theinfluence of the constituents, heating temperature and film thickness on the crystalline structure and opticalproperties of the layers has been established. X-ray diffraction analyses have indicated that indium selenide andindium sulfide polycrystalline thin films can be obtained at substrate temperatures as low as 250 °C, the formation ofgallium selenide and gallium sulfide compounds requiring temperatures above 350 °C. The optical measurements ofthe evaporated semiconductor samples with 130 nm thickness have shown energy gap values ranging from 2.0 eV forindium selenide to 2.5 eV for gallium sulfide. For the different thin film evaporated compounds, the band gap and theoptical transmittance increase as the layer thickness decreases.
机译:通过In和/或Ga已经在玻璃基板上获得了各种III-VI族半导体层。 蒸发,随后在250到400°C的温度下在元素Se或S气氛中加热。这 成分,加热温度和膜厚对晶体结构和光学的影响 层的特性已经建立。 X射线衍射分析表明,硒化铟和 硫化铟多晶薄膜可在低至250°C的基板温度下获得,形成 要求温度高于350°C的硒化镓和硫化镓化合物。的光学测量 蒸发后的厚度为130 nm的半导体样品的能隙值范围为2.0 eV,对于 硫化镓的硒化铟达到2.5 eV。对于不同的薄膜蒸发化合物,带隙和 随着层厚度的减小,光学透射率增加。

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