首页> 外文会议>Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) >DETERMINING THE THERMAL ATTRIBUTES OF CMP THROUGH CONTROLLED REMOVAL RATE vs. TEMPERATURE STUDIES
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DETERMINING THE THERMAL ATTRIBUTES OF CMP THROUGH CONTROLLED REMOVAL RATE vs. TEMPERATURE STUDIES

机译:通过控制去除率与温度研究确定CMP的热属性

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This study has shown that information regarding the relative magnitude of the thermally dependent and thermally independent aspects of the ILD and copper CMP processes (as triggered by controlled thermal changes in the system) can be critical in designing novel pads and slurries with controlled chemical and mechanical actions. For example, a chemically resistant novel pad that enhances the chemical attributes of the process while suppressing its mechanical attributes may have a longer pad life due to less mechanical wear. Similarly, alternative balances between the mechanical and chemical attributes of a slurry might lead to lower dishing and erosion for copper CMP applications.
机译:这项研究表明,有关ILD和铜CMP工艺的热相关和热独立方面的相对大小的信息(由系统中受控的热变化触发)对于设计具有受控化学和机械特性的新型垫和浆料至关重要动作。例如,由于减少了机械磨损,因此在增强工艺的化学特性同时抑制其机械特性的耐化学腐蚀的新型垫片中,其使用寿命可能更长。同样,浆液的机械和化学属性之间的替代平衡可能会导致铜CMP应用中较低的凹陷和腐蚀。

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