CMP slurries are fabricated using abrasives such as silica or alumina and a variety of additives in a batch or a continuous mode. Typically the abrasive is added to water with wetting agents and other additives. These include stabilizers, corrosion inhibitors, oxidizers, and other chemistries. Many of these additives can interact with each other causing stability issues. Along with the stability of the finished product, there are also manufacturing concerns that may involve dispersion time, filtration, and clean up of the manufacturing equipment. Addressing both slurry performance and manufacturing parameters simultaneously have been realized with a novel dispersing methodology.
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