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Indium Distribution within In_xGa_(1-x)N Epitaxial Layers: A Combined Resonant Raman Scattering and Rutherford Backscattering Study

机译:In_xGa_(1-x)N外延层中的铟分布:共振拉曼散射和卢瑟福反向散射的组合研究

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We report a Raman spectroscopy study performed at room temperature on In_xGa_(1-x)N epitaxial layers grown by metalorganic chemical vapour deposition on top of GaN/sapphire (0001) substrates. Resonant Raman measurements have been performed using excitation energies of 2.34, 2.54 and 3.02 eV. A shift of the A_1(LO) phonon mode frequency was observed under different excitation energies. This is interpreted with respect to the composition and strain variations within the sample. The A_1(LO) phonon line shape is analysed using a Spatial Correlation Model (SC). The structural parameters were determined by Rutherford backscattering spectrometry (RBS).
机译:我们报告了在室温下对通过GaN /蓝宝石(0001)衬底顶部上的金属有机化学气相沉积法生长的In_xGa_(1-x)N外延层进行的拉曼光谱研究。已使用2.34、2.54和3.02 eV的激发能量进行了共振拉曼测量。在不同的激发能量下,观察到了A_1(LO)声子模频率的变化。关于样品中的组成和应变变化来解释这一点。使用空间相关模型(SC)分析A_1(LO)声子线的形状。结构参数通过卢瑟福背散射光谱法(RBS)确定。

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