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Study of Spin Coating Properties of SU-8 Thick-layer Photoresist

机译:SU-8厚层光刻胶的旋涂性能研究

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In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coaler and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.
机译:本文采用旋转聚结仪和流变仪研究了SU8光致抗蚀剂的涂膜性能,包括膜厚,厚度均匀性和粘度变化。实验结果表明,SU8的涂层质量受纺丝速度,光致抗蚀剂粘度,初始加速度和持续时间等因素的影响。提出了一些建议,以提高厚膜加工中SU8旋涂的质量。

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