Optimization of Chemical-Mechanical Planarization (CMP) from the Viewpoint of Consumable Effects

摘要

Systematic methods for the optimization of CMP from the viewpoint of consumable effects are discussed. Two methods, one, precision control and design of the pad topography, second, precision control and design of the abrasive size distribution are proposed to optimize the material removal rate and non-uniformity in CMP based on a material removal model.