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Preparation and Characterization of Electrodeposited High-B_s CoNiFe Thin Films with High Resistivity and Improvement of Their Corrosion Resistance

机译:电沉积高电阻率高B_s CoNiFe薄膜的制备,表征及耐蚀性的提高

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In order to increase the resistivity of electrodeposited high-B_s CoNiFe thin film, an organic additive such as diethylenetriamine (DET) was added to the plating bath. The desirable soft magnetic CoNiFe film with higher ρ value of 95 μ Ω-cm was developed by the carbon inclusion from the new bath containing DET. The CoNiFe thin film with high p value exhibited the excellent frequency-dependence of the permeability. Although high-ρ CoNiFe thin film did not show the sufficient corrosion resistance, annealing at 250°C for one hour in vacuum led to higher anticorrosion property.
机译:为了增加电沉积的高B_s CoNiFe薄膜的电阻率,将有机添加剂例如二亚乙基三胺(DET)添加到镀浴中。通过从含有DET的新镀液中夹杂碳,开发出了具有ρ值更高的95μΩ-cm的理想软磁CoNiFe膜。具有高p值的CoNiFe薄膜表现出优异的磁导率频率依赖性。尽管高ρCoNiFe薄膜没有显示出足够的耐腐蚀性,但是在250°C的真空中退火1小时可以产生更高的防腐性能。

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