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STRUCTURAL STUDY OF BORON-DOPED GRAPHITE FILMS BY X-RAY DIFFRACTION AND RAMAN SCATTERING

机译：X射线衍射和拉曼散射研究掺硼石墨薄膜的结构

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B atoms dissolve graphite lattice substitutionally up to 2.35 at. % at 2350°C. B doping causes the lattice constant a_0 to increase and the lattice constant C_0 to decrease. B-doped natural graphite shows a Raman forbidden fundamental at 1360 cm"1 due to disorder in basal plane. In the present study, highly crystallized graphite films were prepared and boron-doped. For the boron-doped graphite films, structural study was carried out by measurements of X-ray diffraction and Raman scattering.

机译：B原子可替代地溶解至2.35 at。的石墨晶格。在2350℃下为％。 B掺杂导致晶格常数a_0增加而晶格常数C_0减少。硼掺杂的天然石墨由于基面的无序性而在1360 cm“ 1处显示出拉曼禁带基。在本研究中，制备了高度结晶的石墨膜并掺入了硼。对于掺硼的石墨膜，进行了结构研究通过测量X射线衍射和拉曼散射得出。

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《EUROCARBON 2000 》|2000年|p.831-832|共2页
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Y. Hishiyama; Y. Kaburagi; Y. Soneda;
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中图分类化学工业 ;
关键词
boron-doped graphite; X-ray diffraction; raman scattering;

机译：掺硼石墨X射线衍射;拉曼散射;

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机译：有序相和相变的衍射研究。单晶碳化硅4单层吸附在石墨上的同步辐射X射线散射研究和稀释单轴双极耦合铁磁体L的中子散射研究

STRUCTURAL STUDY OF BORON-DOPED GRAPHITE FILMS BY X-RAY DIFFRACTION AND RAMAN SCATTERING

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