Modeling of production scale reactive deposition

摘要

The Berg model for the reactive deposition of a compound from a metal target is used to predict deposition rate vs.reactive gas flow hysteresis curves. Hysteresis data for one set of deposition conditions is used to develpp the machine dependent parameters for use in the Berg model. The machine characterized in this study is the BOCCT G-85 production flat glass coater, with a single rotating cylinderical magnetron of racterack length 6200 mm, reactively DC sputtering TiO_x. On changing the deposition power or pumping rate, the predicted hysteresis curve in the area of the oxide-to-metal turning point agrees well with experimental data. The experimental hysteresis curves also scale with the predictions of the Berg model at this turning point. This opens new possibilities for stable active control of the hystersis beyond the conventional PID.